| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1448138 | Acta Materialia | 2009 | 7 Pages |
Abstract
The stress behavior of AlN/TiN superlattice film has been studied by means of a crystal-chemical atomic dynamics simulation based on first-principles calculations. The size-effects on stress behavior are demonstrated and discussed in detail. Stress behavior depends not only on AlN thickness but also on structural relaxation and strain distribution in the film. When the AlN thickness exceeds a critical one, the superlattice film is metastable. Stress behavior can be traced to the AlN/TiN interface structure and its variation with strain relaxation, which may reflect the main strain characteristics caused by AlN structural transformation in this film.
Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
D. Chen, Y.M. Wang, X.L. Ma,