Synthesis of nanoporous Cu films by dealloying of electrochemically deposited Cu–Zn alloy films

Crack-free nanoporous Cu films were synthesized by electrochemical deposition of Cu–Zn alloy films by chronoamperometry (CA) at −0.5 V(Ag/AgCl), followed by a two-step chemical dealloying process. Various nanoporous structures were successfully created with very low concentration of less-noble element (3–4 at.% Zn), by a wet-chemical process. In addition to the Zn, less noble constituent, it is believed that Cu oxide formed during the electrochemical deposition might act as less-noble constituent as well.