Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1478566 | Journal of the European Ceramic Society | 2006 | 7 Pages |
Abstract
Silicon oxynitride (Si2N2O) has been prepared from a compacted mixture of silicon and silica under high nitrogen gas using the high-temperature synthesis (SHS) process. The aim of this work was to optimise this reaction by using a preliminary treatment of the raw materials before the combustion. The SHS samples were characterised by using X-ray diffraction and SEM analyses. Rietveld refinement was performed on recorded diffractograms and a very high formation rate for Si2N2O (more than 97 wt%) at low nitrogen pressure was revealed. By studying the influence of the compacting pressure, the nitrogen pressure and the reactant mixture, a mechanism of Si2N2O formation has been suggested.
Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
N. Pradeilles, M.C. Record, R.M. Marin-Ayral,