| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1479743 | Journal of the European Ceramic Society | 2005 | 5 Pages |
Abstract
SiOxNy thin films have been prepared by the Plasma Enhanced Chemical Vapour Deposition (PECVD). From the information acquired by XPS for the composition, ellipsometry for the refractive index and grazing X-rays reflectometry for the density, it is possible to establish a relation between these three characteristics of the layer from the Bruggeman and Clausius-Mossoti equations.
Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
