Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1489742 | Materials Research Bulletin | 2011 | 6 Pages |
Abstract
In this work, the preparation of In2O3–ZnO thin films by electron beam evaporation technique on glass substrates is reported. Optical and electrical properties of these films were investigated. The effect of dopant amount and annealing temperature on the optical and electrical properties of In2O3–ZnO thin films was also studied. Different amount of ZnO was used as dopant and the films were annealed at different temperature. The results showed that the most crystalline, transparent and uniform films with lowest resistivity were obtained using 25 wt% of ZnO annealed at 500 °C.
Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
Reza Keshavarzi, Valiollah Mirkhani, Majid Moghadam, Shahram Tangestaninejad, Iraj Mohammadpoor-Baltork, Hamid Reza Fallah, Mohammad Javad Vahid Dastjerdi, Hamed Reza Modayemzadeh,