Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1494494 | Optical Materials | 2018 | 5 Pages |
Abstract
⺠PL properties of Er ion doped silica films are improved after Cu ion incorporation. ⺠1.54 μm Er PL emission increase is due to a Cu-mediated sensitization mechanism. ⺠Er ions can be excited via Cu sensitizers with enhanced excitation cross section.
Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
E. Trave, E. Cattaruzza, P. Riello,