Structural and optical characterization of ZnO nanocrystalline films deposited by sputtering

Nanocrystalline ZnO thin films were prepared by dc magnetron sputtering in an Ar + O2 gas mixture using two types of targets; one was commercially available zinc metal (purity 99.99%) and the other was pressed Zn metal powder. Influences of the target conditions as well as the oxygen partial pressure on the structural and optical properties were studied. Microstructure of the films was investigated using X-ray diffraction and scanning electron microscopy the optical properties were examined using UV–Visible spectrophotometer. The films deposited from metal target showed better aligned c-axis orientation and exhibited better optical properties compared to films prepared from pressed metal powder target.