Optical excitation of surface phonon polaritons in silicon carbide by a hole array fabricated by a focused ion beam

Silicon carbide (SiC) is a polar material with a lattice resonance in the thermal infrared causing a wavelength interval with a negative dielectric function. Within this interval SiC can support surface waves. To excite surface waves, i.e., surface phonon polaritons (SPP), the sample has to be structured with a periodic micro-pattern. The possibilities of using a focused ion beam (FIB) for microfabrication of periodic microstructures in silicon carbide (SiC) is investigated. We present optimized parameters for the microfabrication of SiC with a FIB, as well as calculated and experimental optical results confirming the sensitive optical properties of the material required for the surface excitation are not destroyed by the preparation process.