Liquid deposition approaches to self-assembled periodic nanomasks

The fabrication of two-dimensional high-aspect-ratio nanostructures is becoming an important area of research for its technological implications, for example in photonics, fluidics and microelectronics. Nanopatterned layers prepared by liquid deposition methods and bottom-up approaches are emerging as good candidates due to the diversity of their structures and the fact that they can be applied to large surfaces. We discuss the recent developments of self-assembled nanomasks and how they can be exploited for efficient pattern transfer on silicon.