| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1498765 | Scripta Materialia | 2013 | 4 Pages |
Abstract
The microstructure and segregation behaviour of sputter-deposited Ni–Mo and Ni–W films were investigated by transmission electron microscopy and X-ray diffraction using laboratory and synchrotron sources. Whereas half of the Mo content segregated already during deposition, W segregation was kinetically hindered. During thermal loading up to 850 K, segregation of Mo and W could be observed. The microstructure of Ni–W films was found to be much more thermally stable than that of Ni–Mo films.
Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
S.J.B. Kurz, C. Ensslen, U. Welzel, A. Leineweber, E.J. Mittemeijer,