Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1498920 | Scripta Materialia | 2013 | 4 Pages |
Abstract
Synchrotron radiation real-time in situ imaging technology was used to study the interfacial reaction in Cu/Sn–9Zn/Cu interconnect during liquid–solid electromigration. The reverse polarity effect, evidenced by the IMC layer at the cathode growing continuously while that at the anode was restrained, resulted from the directional migration of Zn atoms toward the cathode under electron current stressing, which is induced by the positive effective charge number of Zn atoms but not by the back-stress. The severe dissolution of Cu anode was explained theoretically.
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Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
M.L. Huang, Z.J. Zhang, N. Zhao, Q. Zhou,