Article ID Journal Published Year Pages File Type
1500400 Scripta Materialia 2011 4 Pages PDF
Abstract

Utilizing a high atomic hydrogen concentration, highly selective formation of micrometer-sized diamond and β-SiC crystals is achieved in a microwave plasma chemical vapour deposition process. The high atomic hydrogen concentration, generated by a high microwave power density, hinders secondary heterogeneous nucleation and therefore enhances the selectivity of CH3 and SiH3 deposition onto diamond and β-SiC crystals, respectively. Based on experimental observation, an H-induced selective growth model is proposed that explains the mechanisms.

Graphical abstractFigure optionsDownload full-size imageDownload high-quality image (137 K)Download as PowerPoint slide

Related Topics
Physical Sciences and Engineering Materials Science Ceramics and Composites
Authors
, , , ,