Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1500400 | Scripta Materialia | 2011 | 4 Pages |
Abstract
Utilizing a high atomic hydrogen concentration, highly selective formation of micrometer-sized diamond and β-SiC crystals is achieved in a microwave plasma chemical vapour deposition process. The high atomic hydrogen concentration, generated by a high microwave power density, hinders secondary heterogeneous nucleation and therefore enhances the selectivity of CH3 and SiH3 deposition onto diamond and β-SiC crystals, respectively. Based on experimental observation, an H-induced selective growth model is proposed that explains the mechanisms.
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Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
Hao Zhuang, Lei Zhang, Thorsten Staedler, Xin Jiang,