| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1500879 | Scripta Materialia | 2010 | 4 Pages |
Abstract
A series of Pd–Mg thin films with various thicknesses of Mg were prepared by magnetron sputtering. Their thickness-dependent hydrogen absorption kinetics in the temperature range 298–338 K was investigated by modeling the resistance. The hydrogen diffusion in MgH2 films was investigated by electrochemical measurements. We discuss the dominating factor of the absorption kinetics and the critical thickness of the passivating MgH2 layer, as well as the requirements for the advanced hydrogen storage materials under mild conditions.
Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
Jianglan Qu, Bo Sun, Rong Yang, Wei Zhao, Yuntao Wang, Xingguo Li,