Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1501174 | Scripta Materialia | 2010 | 4 Pages |
Abstract
The effect of residual hydrogen, sorbed during the deposition process, on the hydrogenation behavior of ion-beam sputtered titanium thin films was investigated. Electromotive force and in situ stress measurements were conducted to study hydrogen absorption, phase boundaries and hydrogen-induced stress development in the Ti–H thin film system. Tests were conducted on both as-sputtered and previously discharged films; the effect of residual hydrogen is significantly manifested in the thermodynamic isotherms and stress–concentration curves.
Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
E. Tal-Gutelmacher, A. Pundt, R. Kirchheim,