Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1501924 | Scripta Materialia | 2008 | 4 Pages |
Abstract
Far from equilibrium, immiscible nanocrystalline Cu–Ag alloy thin films of nominal composition Cu–30(±5) at.% Ag were deposited by co-sputtering. While films deposited at ∼300 K exhibit a two-phase mixture of face-centered cubic (fcc) Ag + fcc Cu, those deposited either at ∼100 K or at low power (∼40 W) exhibit an fcc Cu–25 at.% Ag solid solution, excess fcc Ag and small fractions of a metastable hexagonal (4H) Cu–Ag phase. Increasing the sputtering gas pressure leads to phase separation into fcc Cu, fcc Ag and metastable 4H Cu–Ag.
Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
Smita Gohil, Rajarshi Banerjee, Sangita Bose, Pushan Ayyub,