Article ID Journal Published Year Pages File Type
1501924 Scripta Materialia 2008 4 Pages PDF
Abstract

Far from equilibrium, immiscible nanocrystalline Cu–Ag alloy thin films of nominal composition Cu–30(±5) at.% Ag were deposited by co-sputtering. While films deposited at ∼300 K exhibit a two-phase mixture of face-centered cubic (fcc) Ag + fcc Cu, those deposited either at ∼100 K or at low power (∼40 W) exhibit an fcc Cu–25 at.% Ag solid solution, excess fcc Ag and small fractions of a metastable hexagonal (4H) Cu–Ag phase. Increasing the sputtering gas pressure leads to phase separation into fcc Cu, fcc Ag and metastable 4H Cu–Ag.

Related Topics
Physical Sciences and Engineering Materials Science Ceramics and Composites
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