| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1502405 | Scripta Materialia | 2006 | 4 Pages |
Abstract
Crystallization behaviors of amorphous Ti-Ni thin films were investigated by means of in situ X-ray diffraction measurements within the temperature interval 420-450 °C. The results showed that crystalline Ti-Ni thin films displayed (1 1 0) preferential orientation. Analysis of the crystallization kinetics yielded Avrami exponents in the range 2.0-2.4 and an activation energy of 358.1 kJ/mol. A site-saturation nucleation mechanism is proposed for the crystallization of amorphous Ti-Ni thin films.
Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
Lei Zhang, Chaoying Xie, Jiansheng Wu,