Article ID Journal Published Year Pages File Type
1502406 Scripta Materialia 2006 4 Pages PDF
Abstract

The edge-to-edge matching model, which was originally developed for predicting crystallographic features in diffusional phase transformations in solids, has been used to understand the formation of in-plane textures in TiSi2 (C49) thin films on Si single crystal (0 0 1)Si surface. The model predicts all the four previously reported orientation relationships between C49 and Si substrate based on the actual atom matching across the interface and the basic crystallographic data only. The model has strong potential to be used to develop new thin film materials.

Related Topics
Physical Sciences and Engineering Materials Science Ceramics and Composites
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