| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1502641 | Scripta Materialia | 2006 | 4 Pages |
Abstract
Nanocrystalline tantalum thin film was prepared by radio frequency magnetron sputtering on a glass substrate. The structure and mechanical properties of the as-deposited thin film were investigated by X-ray diffraction, transmission electron microscopy, and nanoindentation. The salient feature in the present tantalum thin film with a grain size of 76.5 nm is the remarkable enhancement of hardness, being about one order of magnitude higher than that of bulk coarse-grained tantalum.
Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
M. Zhang, B. Yang, J. Chu, T.G. Nieh,