Characterization of Cr–Ni multilayers electroplated from a chromium(III)–nickel(II) bath using pulse current

Cr–Ni multilayers with thickness modulation of several tens of nanometers were prepared by pulse-current electroplating from a Cr(III)–Ni(II) bath at 30 °C. The Cr–Ni multilayers were composed of alternate amorphous Cr-rich and nanocrystalline Ni-rich layers. This amorphous Cr-rich layer could be attributed to a reduction in the complex-formed Cr ion, which leads to the presence of C, a glass-forming element, in the Cr-rich deposit during electrodeposition. Twins were found in the nanosized Ni-rich layer, in which stacking faults were frequently observed.