Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1503368 | Scripta Materialia | 2007 | 4 Pages |
An iron oxynitride film was deposited on silicon and glass substrates by magnetron sputtering in an Ar–N2–O2 reactive mixture. Rutherford back-scattering spectrometry was used to determine the film composition (Fe1.06O0.35N0.65). X-ray diffraction revealed the formation of a face-centred cubic (fcc) structure with a lattice parameter close to that of γ‴-FeN. X-ray photoelectron spectroscopy showed the occurrence of Fe–N and Fe–O bonds in the film. The local environment of iron atoms studied by 57Fe Mössbauer spectrometry at both 300 and 77 K gives clear evidence that the Fe1.06O0.35N0.65 is not a mixture of iron oxide and iron nitride phases. Despite a small amount of an iron nitride phase, the main sample consists of an iron oxynitride phase with an NaCl-type structure where oxygen atoms partially substitute for nitrogen atoms, thus indicating the formation of a iron oxynitride with an fcc structure.