Article ID Journal Published Year Pages File Type
1503368 Scripta Materialia 2007 4 Pages PDF
Abstract

 An iron oxynitride film was deposited on silicon and glass substrates by magnetron sputtering in an Ar–N2–O2 reactive mixture. Rutherford back-scattering spectrometry was used to determine the film composition (Fe1.06O0.35N0.65). X-ray diffraction revealed the formation of a face-centred cubic (fcc) structure with a lattice parameter close to that of γ‴-FeN. X-ray photoelectron spectroscopy showed the occurrence of Fe–N and Fe–O bonds in the film. The local environment of iron atoms studied by 57Fe Mössbauer spectrometry at both 300 and 77 K gives clear evidence that the Fe1.06O0.35N0.65 is not a mixture of iron oxide and iron nitride phases. Despite a small amount of an iron nitride phase, the main sample consists of an iron oxynitride phase with an NaCl-type structure where oxygen atoms partially substitute for nitrogen atoms, thus indicating the formation of a iron oxynitride with an fcc structure.

Related Topics
Physical Sciences and Engineering Materials Science Ceramics and Composites
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