| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1505760 | Solid State Sciences | 2010 | 6 Pages |
The MoO3 thin films were prepared via sol–gel dip coating method on glass and FTO glass substrate. The optical and other properties of multilayered MoO3 films with 2–10 layers were investigated. The MoO3 films were studied using UV–Visible transmission, XRD, SEM, FTIR and Cyclic Voltammetry (CV) measurements. The band gap value for MoO3 films was evaluated and in the range of 3.2 eV–3.72 eV. The XRD spectrum reveals that the crystallinity increases along the (020) and (040) planes with the increase in thickness. The SEM images showed the formation of nanorods upto six layers. The FTIR spectrum confirms the formation of MoO3. The 6 layered films show the maximum anodic (spike)/cathodic (peak) diffusion coefficient of 18.84/1.701 × 10−11 cm2/s. The same film exhibits the change in optical transmission of 49% with the bleached/coloured state transmission of 62/13%.
Graphical abstractFig 5c. SEM image of 6 layered MoO3 filmsFigure optionsDownload full-size imageDownload as PowerPoint slide
