Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1508092 | Cryogenics | 2009 | 4 Pages |
Abstract
The standard version of the EKV3 compact model is evaluated for simulation of mixed analog–digital circuits working at low temperature (77–200 K). This evaluation is performed on a dual gate oxide CMOS technology with 0.18 μm/1.8 V and 0.35 μm/3.3 V MOSFET transistors. A detailed temperature analysis of some physical effects is performed. Specific effects, such as anomalous narrow channel effect, freeze-out in Lightly Doped drain (LDD) regions or quantization of the inversion charge, are observed at low or intermediate temperature. Some improvements of this compact model will allow a more accurate description of MOS transistors at low temperature.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Electronic, Optical and Magnetic Materials
Authors
P. Martin, M. Cavelier, R. Fascio, G. Ghibaudo, M. Bucher,