Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1508095 | Cryogenics | 2009 | 4 Pages |
Abstract
This paper demonstrates significant aspects of low-temperature minority-carrier injection in n-channel dynamic-threshold (DT) MOSFET having various silicon-on-insulator (SOI) layer thicknesses. Drain current vs. gate voltage and gate current vs. gate voltage characteristics are evaluated at temperatures ranging from 300 K to 30 K, and minority-carrier injection is characterized. Impacts of temperature, channel length, and silicon-on-insulator layer thickness on opposite drain current behavior are discussed by examining transconductance behavior.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Electronic, Optical and Magnetic Materials
Authors
Yasuhisa Omura, Takayuki Tochio,