Deposition of TiO2 Blocking Layers of Photovoltaic Cell Using RF Magnetron Sputtering Technology

Dye-sensitized solar cells (DSCs) have used transparent conductive Fluorine-doped SnO2 (FTO) glass/porous TiO2 layer attached using dye molecules/electrolytes (I-/I3-)/Pt-coated FTO glass configuration. In this work, prior to the coating of nanoporous TiO2 layer on FTO glass, a dense layer of TiO2 less than ∼100 nm in thickness as an electron blocking layer was deposited directly onto the FTO using radio frequency (RF) magnetron sputtering technology. Under 100 mW/cm2 illumination at AM 1.5, the energy conversion efficiency () of the prepared DSC with electron blocking layer of 60 nm thickness was 6.77% (Voc = 0.715 V, Jsc = 12.932 mA/cm2, ff = 0.74), which is increased by 1.27% compared to the general cell without electron blocking layer.