Article ID Journal Published Year Pages File Type
1516429 Journal of Physics and Chemistry of Solids 2013 5 Pages PDF
Abstract
► We used an ultrahigh-vacuum chemical vapor deposition system to grow SiGe multilayers. ► Pile-up is due the strongly interdiffusion from the annealing treatment. ► Elastic/plastic contact translation was represented at the crucial load of 2000 μN.
Keywords
Related Topics
Physical Sciences and Engineering Materials Science Electronic, Optical and Magnetic Materials
Preview
Effect of the adhesion strength of Si and Ge superlattices
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