Nanocrystalline Au:Ag:SnO2 films prepared by pulsed magnetron sputtering

Influence of annealing temperature on structural, compositional, surface morphology, electrical, and optical properties of pulsed magnetron sputtered nanocrystalline Au:Ag:SnO2 films was investigated by several analytical techniques. From the XRD results, the films were polycrystalline with the absence of impurity phases and the films were grown preferentially in the (110) orientation of SnO2 with tetragonal structure. The surface smoothness and grain size of the films increases with annealing temperature. Photoluminescence measurements show that the as deposited Au:Ag:SnO2 films exhibited a broad emission peak at 536 nm (2.31 eV). The lowest electrical resistivity of 0.005 Ω cm was obtained at the films annealed at 500 °C. The optical studies show that the visible transmittance and band gap of the films increases with annealing temperature.

► The nanocrystalline Au:Ag:SnO2 films were prepared by pulsed direct current magnetron sputtering. ► After annealing, the homogeneity and smoothness of the films were improved. ► The low electrical resistivity of 0.005 Ω cm with optical transmittance of 89% were obtained at annealing temperature of 500 °C.Figure optionsDownload full-size imageDownload as PowerPoint slide