Effect of in-grain porous silicon structure on photovoltaic device

In this paper, a new porous silicon structure with good anti-reflection ability is proposed. An amorphous silicon film was deposited on the silicon wafer and subjected to a wet etching process. During the etching process, the amorphous silicon film acted as a grid structure with many micromasks and resulted in poor uniformity of etching process. Thus, it enhanced the etching process and a randomized surface morphology was obtained. There was nearly no reflectance detected within the visible-light wavelength region. When this new structure was applied to solar cell, it could act as a photon absorber that captures most of the photons incident on the surface of substrate and the performance of solar cell could be improved remarkably.