| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1518415 | Journal of Physics and Chemistry of Solids | 2007 | 5 Pages |
Abstract
This paper will present some issues which must be solved in order to satisfy future needs for lithographic masks. The focus of the presentation is to examine shortcomings of materials used in today's technology and provides a description of the properties needed for future materials.
Related Topics
Physical Sciences and Engineering
Materials Science
Electronic, Optical and Magnetic Materials
Authors
Pavel Nesladek,