Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1521462 | Materials Chemistry and Physics | 2015 | 10 Pages |
Abstract
LiNbO3 films of high epitaxial quality and with thicknesses of 120-500 nm were deposited at 650 °C on C-sapphire by atmospheric pressure metal-organic chemical vapour deposition. Li nonstoichiometry, residual stresses, twinning, and thermal expansion of the films as a function of the film thickness were investigated by means of Raman spectroscopy and X-ray diffraction. The relaxation of residual stresses, Li2O loss, inelastic deformation and elastic hysteresis during cycles of heating up to 860 °C and cooling down to room temperature were studied, as well. The residual stresses and thermal expansion of films were highly thickness dependent. It was shown that the {011¯2} twinning contributed to the stress relaxation in the thick LiNbO3 films.
Keywords
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Materials Science
Electronic, Optical and Magnetic Materials
Authors
A. Bartasyte, V. Plausinaitiene, A. Abrutis, S. Stanionyte, S. Margueron, V. Kubilius, P. Boulet, S. Huband, P.A. Thomas,