| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1522757 | Materials Chemistry and Physics | 2013 | 9 Pages |
Abstract
⺠Very thin non-stoichiometric amorphous SiC (a-SiCx) layers are deposited by LPCVD. ⺠Layers of 20 nm are continuous, show tensile stress and high chemical inertness. ⺠Electron transparent windows made of a-SiCx are fabricated. ⺠a-SiCx windows are highly transparent allowing TEM images with 0.12 nm resolution. ⺠a-SiCx windows show high resistance to TEM electron beam.
Related Topics
Physical Sciences and Engineering
Materials Science
Electronic, Optical and Magnetic Materials
Authors
B. Morana, G. Pandraud, J.F. Creemer, P.M. Sarro,