Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1523303 | Materials Chemistry and Physics | 2012 | 7 Pages |
Abstract
⺠Epitaxial LiCoO2 thin films were formed on the Al2O3 (0 0 0 1) substrate by PLD at room temperature and annealed at 600 °C in air. ⺠The orientation relationship between film and substrate is revealed. ⺠Crystalline phases in the RT deposited and annealed thin films are clearly identified. ⺠Atomic level interface structure indicates an interface reaction during annealing. ⺠A phase transition mechanism from fully disordered LiCoO2 to fully ordered LiCoO2 is proposed.
Related Topics
Physical Sciences and Engineering
Materials Science
Electronic, Optical and Magnetic Materials
Authors
Rong Huang, Taro Hitosugi, Craig A.J. Fisher, Yumi H. Ikuhara, Hiroki Moriwake, Hideki Oki, Yuichi Ikuhara,