Article ID Journal Published Year Pages File Type
1523664 Materials Chemistry and Physics 2012 4 Pages PDF
Abstract
► Fluorine ion was implanted into the buffer oxide to form fluorine-silicate-glass (FSG). ► Ni-induced lateral crystallization (NILC) was used to fabricate poly-Si TFT on either oxide (NILC-TFT) or FSG (FSG-TFT). ► The performance of FSG-TFT was better than that of NILC-TFT.
Related Topics
Physical Sciences and Engineering Materials Science Electronic, Optical and Magnetic Materials
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