Article ID Journal Published Year Pages File Type
1524977 Materials Chemistry and Physics 2011 4 Pages PDF
Abstract

A new series of photosensitive poly(arylene ether sulfone)s containing chalcone moiety in the main chain were synthesized from 4,4′-dihydroxychalcone (4DHC), 4,4′-difluorodiphenylsulfone (DFDPS) and bisphenol A (BPA). This series of polymers were characterized by 1H NMR, FT-IR, UV spectroscopy, thermogravimetric analysis (TGA) and differential scanning calorimetry (DSC). The polymers were stable up to 400 °C, which indicates that the polymers possess good thermal properties. The polymers were found to be soluble in polar solvents and chlorinated solvents. However, the polymers were insoluble in hydrocarbons and in hydroxyl group-containing solvents. After the irradiation of UV light, the thin polymer film was crosslinked to give an insoluble film in the absence of a photoinitiator or sensitizers. The rate of photocrosslinking was also examined and discussed.

Research highlights▶ A series of novel photosensitive poly(arylene ether sulfone)s (PAESs) containing chalcone moiety in the main chain have been successfully synthesized. ▶ The photo-crosslinking of polymer film was carried out under UV irradiation without photoinitiator. ▶ The resulting polymers showed good thermal stability and excellent chemical stability after crosslinking.

Related Topics
Physical Sciences and Engineering Materials Science Electronic, Optical and Magnetic Materials
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