Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1526925 | Materials Chemistry and Physics | 2008 | 4 Pages |
Abstract
Both up and down compositionally graded Ba1âxSrxTiO3 (BST) thin films with increasing x from 0 to 0.4 were deposited on Si and Pt/Ti/SiO2/Si substrates using sol-gel technique. The microstructure of the graded BST films were characterized by X-ray diffraction (XRD), Raman spectra, scanning electron microscopy (SEM) and atomic force microscopy (AFM). The down graded BST film had a larger dielectric constant and lower dielectric loss than the up graded film. The tunability of the up and down graded BST films was 42.3 and 38.9%, respectively, at an applied field of 250Â kVÂ cmâ1 and measurement frequency of 1Â MHz at room temperature. Both of the graded films had low-leakage current density. While, the leakage current density of down graded film lower two orders than the up graded BST film at the applied electric field below 100Â kVÂ cmâ1. This may be due to the BaTiO3 layer in the down graded BST film not only serves as a bottom layer but also as an excellent seeding layer to improve the electric properties of the film.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Electronic, Optical and Magnetic Materials
Authors
Jun Wang, Tianjin Zhang, Junhuai Xiang, Baishun Zhang,