| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1528639 | Materials Science and Engineering: B | 2015 | 7 Pages |
•Si-based thin-film memristor structure was fabricated by magnetron sputtering.•We study bipolar resistive switching and charge transport mechanisms.•Resistive switching parameters are determined by a balance between redox reactions.
Reproducible bipolar resistive switching has been studied in SiOx-based thin-film memristor structures deposited by magnetron sputtering technique on the TiN/Ti metalized SiO2/Si substrates. It is established that, after electroforming, the structure can be switched between the quasi-ohmic low-resistance state related to silicon chains (conducting filaments) and the high-resistance state with semiconductor-like hopping mechanism of charge transport through the defects in silicon oxide. The switching parameters are determined by a balance between the reduction and oxidation processes that, in turn, are driven by the value and polarity of voltage bias, current, temperature and device environment. The results can be used for the development of silicon-based nonvolatile memory and memristive systems as a key component of future electronics.
Graphical abstractFigure optionsDownload full-size imageDownload as PowerPoint slide
