| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1528952 | Materials Science and Engineering: B | 2013 | 6 Pages |
•Aluminum and indium selenide thin films are used to design MgO tunneling diodes.•The Al/MgO/C and C/MgO/InSe/C tunneling diode structures are characterized.•The C/MgO/InSe/C device exhibited a peak to valley current ratio of 135.•It reflected negative resistance effect in the voltage range of 0.94–2.24.•A resonance peak located at 39 MHz was observed.
In this work, the design and characterization of magnesium oxide based tunneling diodes which are produced on Al and InSe films as rectifying substrates are investigated. It was found that when Al thin films are used, the device exhibit tunneling diode behavior of sharp valley at 0.15 V and peak to valley current ratio (PVCR) of 11.4. In addition, the capacitance spectra of the Al/MgO/C device show a resonance peak of negative capacitance (NC) values at 44.7 MHz. The capacitance and resistance–voltage characteristics handled at an ac signal frequency of 100 MHz reflected a build in voltage (Vbi) of 1.29 V and a negative resistance (NR) effect above 2.05 V. This device quality factor (Q)–voltage response is ~104. When the Al substrate is replaced by InSe thin film, the tunneling diode valley appeared at 1.1 V. In addition, the PVCR, NR range, NC resonance peak, Q and Vbi are found to be 135, 0.94–2.24 and 39.0 MHz, ~105 and 1.34 V, respectively. Due to the wide differential negative resistance and capacitance voltage ranges and due to the response of the C/MgO/InSe/C device at 1.0 GHz, these devices appear to be suitable for applications as frequency mixers, amplifiers, and monostable–bistable circuit elements (MOBILE).
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