Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1529188 | Materials Science and Engineering: B | 2012 | 5 Pages |
Abstract
A study on the formation of Black Silicon on crystalline silicon surface using SF6/O2 and SF6/O2/CH4 based plasmas in a reactive ion etching (RIE) system is presented. The effect of the RF power, chamber pressure, process time, gas flow rates, and gas mixtures on the texture of silicon surface has been analyzed. Completely Black Silicon surfaces containing pyramid like structures have been obtained, using an optimized mask-free plasma process. Moreover, the Black Silicon surfaces have demonstrated average values of 1% and 4% for specular and diffuse reflectance respectively, feature that is suitable for the fabrication of low cost solar cells.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Electronic, Optical and Magnetic Materials
Authors
D. Murias, C. Reyes-Betanzo, M. Moreno, A. Torres, A. Itzmoyotl, R. Ambrosio, M. Soriano, J. Lucas, P. Roca i Cabarrocas,