Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1530770 | Materials Science and Engineering: B | 2009 | 4 Pages |
Abstract
Heterostructure light-emitting diodes (LEDs) were fabricated by growing Ga-doped n-ZnO and undoped ZnO layers on p-GaN/Al2O3 templates. The p–n junction showed a diode like I–V characteristic and emitted electroluminescence (EL) peaks at 430 nm, 440 nm and 480 nm along with a broad band of yellow light. An interfacial layer was observed between ZnO and GaN, identified as ZnGa2O4 by transmission electron microscopy and X-ray diffraction analysis. It was observed that thickness of the interfacial layer did not significantly affect EL characteristics of the ZnO/GaN heterostructure LED.
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Authors
Seung-Ho Hwang, Tae-Hoon Chung, Byung-Teak Lee,