Improvement of the uniformity in electronic properties of AZO films using an rf magnetron sputtering with a mesh grid electrode

We have investigated the deposition of Al-doped ZnO (AZO) films using a radio frequency (rf) magnetron sputtering apparatus with a mesh grid electrode. The improvement of the uniformity of crystallinity was achieved by the effect of the appropriate negative grid biases that suppress the impingement of charged particles onto the films surface. The uniformity of the electronic properties such as resistivity, carrier concentration and Hall mobility was also improved.