| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1530872 | Materials Science and Engineering: B | 2008 | 4 Pages |
Abstract
The surface sputtering of Si using a proto-type ion gun to utilize metal cluster complexes as ion source has been investigated in detail mainly using Auger spectroscopy and atomic force microscope. The Si surface previously was found to be successfully sputtered with a high sputtering yield and yet resulting in a reasonably smooth surface. However cluster ion beams was not irradiated except Si. Here we report the result of surface irradiated of high orientated pyrolytic graphite (HOPG) using a proto-type compact cluster ion source which has been developed using Os3(CO)12. The irradiated HOPG surface was observed by using atomic force microscope (AFM) and scanning electron microscope (SEM) and AES.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Electronic, Optical and Magnetic Materials
Authors
Yoshikazu Teranishi, Kouji Kondou, Takeshi Mizota, Yukio Fujiwara, Akihiro Kushino, Youhei Kobayasi, Kazumasa Nakamura, Masanori Ishizuka, Tsuyoshi Yokosawa, Hidehiko Nonaka,