Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1531318 | Materials Science and Engineering: B | 2007 | 7 Pages |
Abstract
Vanadium oxide films were fabricated by two techniques—reactive deposition in oxygen-containing plasma and metal vanadium vacuum deposition with subsequent oxidation in air. It has been shown that the latter process allows formation of the films having reduced phase transition temperature ∼50 °С. The proposed capacitor design of sensitive element excludes electrical contacts to vanadium oxide, so the element is less crytical to degradation and current noise effects.
Related Topics
Physical Sciences and Engineering
Materials Science
Electronic, Optical and Magnetic Materials
Authors
A. Khodin, Hak-In Hwang, Sung-Min Hong, V. Zalessky, T. Leonova, M. Belov, E. Outkina,