Fabrication antireflection (AR) coatings for P-polarized 193 nm laser light at an incidence angle of 74°

The antireflection coatings for P-polarized light at large incidence angle (68°–75°) are widely used in the ArF excimer laser microlithography light source system and other optical surfaces (e.g., in lenses, prisms, etc.) to suppress undesirable reflections. So the AR coatings for P-polarized 193 nm laser beam at an incidence angle of 74° were designed and fabricated. The results showed that after coating, the residential reflection of the optical components reduced dramatically, which could greatly improve the output efficiency of the optical components in the DUV range.