Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1538542 | Optics Communications | 2009 | 7 Pages |
Abstract
Silicon-rich SiGe alloys represent a promising platform for the development of large-area single-mode optical waveguides to be integrated in silicon-based optical circuits. We find that SiGe layers epitaxially grown on Si successfully guide radiation with a 1.55 μm wavelength, but, beyond a critical core thickness, their optical properties are strongly affected by the clustering of misfit dislocations at the interface between Si and SiGe, leading to a significant perturbation of the local refractive index. Transmission electron microscopy and micro-Raman spectroscopy, together with finite-element simulations, provide a complete analysis of the impact of dislocations on optical propagation.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Electronic, Optical and Magnetic Materials
Authors
A. Trita, F. Bragheri, I. Cristiani, V. Degiorgio, D. Chrastina, D. Colombo, G. Isella, H. von Känel, F. Gramm, E. Müller, M. Döbeli, E. Bonera, R. Gatti, F. Pezzoli, E. Grilli, M. Guzzi, L. Miglio,