Reflection 4f coherent imaging technique for measurements of optical nonlinearity

A one-laser-shot measurement technique, which can characterize the nonlinear optical properties of the film prepared on the opaque substrates conveniently and exactly, is presented. This method is based on the reflection 4f coherent imaging system with phase objects. The proposed technique is examined in the case of a novel ultrathin film [CuPc(COONa)4]/PDDA coated on an opaque silicon substrate with 532 nm picosecond laser pulses. By measuring the reflected intensity, but not the transmitted one, we verify both nonlinear absorption and refraction of the coated thin film. This progress obviously ensures that nonlinearities caused by reflection of opaque surfaces are measurable.