Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1539304 | Optics Communications | 2009 | 4 Pages |
Abstract
A low-junction-temperature light emitting diode (LED) by selectively ion-implantation in part of the p-type GaN layer is demonstrated. The junction temperature extracted from a forward voltage method of an ion-implanted LED is significantly lower than that of a conventional LED. Furthermore, the linearity of the luminescence-current curve of the device is improved without altering electrical properties.
Related Topics
Physical Sciences and Engineering
Materials Science
Electronic, Optical and Magnetic Materials
Authors
Yun-Wei Cheng, Hung-Hsien Chen, Min-Yung Ke, Cheng-Pin Chen, Jian Jang Huang,