Laser fabrication of high-aspect-ratio holes and grooves in photoresist by time constant manipulation

We report on the cw-laser fabrication of sharp-edged holes and grooves in organic-dye-sensitized photoresists for g-line or i-line by manipulating its intensity and scanning rate. The laser fabrication is performed to locally control the reaction time constant of the photoresist. By scanning a tightly focused laser focal spot inside the transparent photoresist, various micron/submicron meter structures have been produced based on the reaction time constant depending on the beam intensity. The proposed method is considered to be a cost-effective technique for high-aspect-ratio holes and grooves fabrication.