Article ID Journal Published Year Pages File Type
1542992 Photonics and Nanostructures - Fundamentals and Applications 2013 6 Pages PDF
Abstract

We present a solution to the difficult task of removing an oxide-based hard mask from a photonic crystal fabricated in the GaAs/AlGaAs system. We use a polymer backfill technique to seal the AlGaAs layer, thereby making it inaccessible to the wet-etch solution. This allows us to use a GaAs active layer for the photonic crystal placed on an oxidised AlGaAs layer which provides mechanical and thermal support. Using this technique, we fabricated GaAs-based photonic crystal cavities and measured respectable quality factors (Q ≈ 2200) despite the intrinsic asymmetry of the system. The technique presents a viable method for producing electrically injected photonic crystal cavities for operation on a mechanically stable and thermally conducting buffer layer.

► Novel and innovative fabrication of photonic crystal nanocavities with oxidised bottom cladding. ► Etching is achieved through a hard mask, which is removed without desolving the AlGaAs. ► Protection of AlGaAs is achieved by a polymer backfill that blocks the access of the wet etchant to the AlGaAs. ► Respectable quality factors of up to 2200 were achieved, which are the highest reported in these type of systems.

Related Topics
Physical Sciences and Engineering Materials Science Electronic, Optical and Magnetic Materials
Authors
, , , , , ,