| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1547212 | Physica E: Low-dimensional Systems and Nanostructures | 2007 | 6 Pages |
Abstract
InN films and nanorods were grown by hydride metalorganic vapor phase epitaxy (H-MOVPE) and the effects of growth temperature, and NH3/TMIn and HCl/TMIn ratios on morphological dependences were studied. The growth habit of InN varied from thin film to microrod to nanorod to no deposition as the growth conditions were changed about transition from growth to etching conditions. The growth and etch regimes were also predicted by chemical equilibrium calculations of In–C–H–Cl–N-inert system. The optical properties of InN nanorods and columnar structured films were measured by room temperature PL and a maximum intensity was observed at 1.08 eV for both structures.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Electronic, Optical and Magnetic Materials
Authors
Hyun Jong Park, Olga Kryliouk, Tim Anderson, Dmitry Khokhlov, Timur Burbaev,