Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1547470 | Physica E: Low-dimensional Systems and Nanostructures | 2009 | 4 Pages |
Abstract
A simple low cost method of nanoimprinting has been developed. The technique uses a flexible disposable master and lends itself to roll-to-roll processing. Residual layer thicknesses of 5-10Â nm are routinely achieved. This enables the critical step of pattern transfer into hard substrates by reactive ion etching, an essential step in the fabrication of sub-wavelength photonic device elements on a wafer-scale.
Related Topics
Physical Sciences and Engineering
Materials Science
Electronic, Optical and Magnetic Materials
Authors
G. Hubbard, S.J. Abbott, Q. Chen, D.W.E. Allsopp, W.N. Wang, C.R. Bowen, R. Stevens, A. Å atka, D. HaÅ¡ko, F. Uherek, J. KováÄ,