| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1547693 | Physica E: Low-dimensional Systems and Nanostructures | 2007 | 4 Pages |
Abstract
Si nanocrystals were formed in the non-stoichiometric Si-enriched SiNx low-pressure chemical vapor deposited (LPCVD) coatings on Si wafers treated by various modes. The coating structure as a function of technological conditions was investigated by ellipsometry and X-ray photoelectron spectroscopy (XPS) depth profiling. It was found that nanocomposites on base of SiNx films enriched by Si have a complex multilayered structure varying in dependence of deposition and annealing parameters. Analysis of the XPS spectra and Si 2s peaks shows the existence and quantity of four chemical structures corresponding to the Si-O, Si-N states, nanocrystalline and amorphous Si. The XPS results show evolution of the chemical structure of silicon nitride and formation of Si nanocrystals. It was found:
Keywords
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Physical Sciences and Engineering
Materials Science
Electronic, Optical and Magnetic Materials
Authors
D.L. Wainstein, A.I. Kovalev, Cs. Ducso, T. Jaszi, P. Basa, Zs.J. Horvath, T. Lohner, P. Petrik,